Semiconductor device

ABSTRACT

Disclosed is a semiconductor device comprising a substrate including a first region and a second region, a first gate pattern on the substrate of the first region, and a second gate pattern on the substrate of the second region. The first gate pattern comprises a first high-k dielectric pattern, a first N-type metal-containing pattern, and a first P-type metal-containing pattern that are sequentially stacked. The second gate pattern comprises a second high-k dielectric pattern and a second P-type metal-containing pattern that are sequentially stacked.

CROSS-REFERENCE TO RELATED APPLICATIONS

This U.S. nonprovisional application is a Continuation of U.S. application Ser. No. 16/288,590, filed on Feb. 28, 2019, which is claims priority under 35 U.S.C § 119 to Korean Patent Application No. 10-2018-0047410 filed on Apr. 24, 2018 in the Korean Intellectual Property Office, the entire contents of each of which are hereby incorporated by reference.

BACKGROUND

Inventive concepts relate to a semiconductor device.

A semiconductor device includes a plurality of transistors. The transistors integrated in the semiconductor device are formed to have various structures based on required performances such as operating voltages and/or driving currents. For example, there has been developed a complementary metal oxide semiconductor (CMOS) device including an NMOS transistor and a PMOS transistor whose metal gate electrodes have different conductivity from each other. In addition, the CMOS device includes a gate dielectric layer whose thickness is different based on an applied voltage.

SUMMARY

Some embodiments of inventive concepts provide a semiconductor device with enhanced reliability.

According to some example embodiments of inventive concepts, a semiconductor device may comprise: a substrate comprising a first region and a second region; a first gate pattern on the substrate of the first region; and a second gate pattern on the substrate of the second region. The first gate pattern may comprise a first high-k dielectric pattern, a first N-type metal-containing pattern, and a first P-type metal-containing pattern that are sequentially stacked. The second gate pattern may comprise a second high-k dielectric pattern and a second P-type metal-containing pattern that are sequentially stacked.

According to some example embodiments of inventive concepts, a semiconductor device may comprise: a substrate comprising a cell array region, a first peripheral region, and a second peripheral region; a bit line running across the substrate on the cell array region; a buffer layer between the bit line and the substrate; a first peripheral gate pattern on the substrate of the first peripheral region; and a second peripheral gate pattern on the substrate of the second peripheral region. The first peripheral gate pattern may comprise a first high-k dielectric pattern, a first N-type metal-containing pattern, and a first P-type metal-containing pattern that are sequentially stacked. The second peripheral gate pattern may comprise a second high-k dielectric pattern and a second P-type metal-containing pattern that are sequentially stacked.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1A illustrates a cross-sectional view showing a semiconductor device according to example embodiments of inventive concepts.

FIG. 1B illustrates an enlarged view showing section P3 of FIG. 1A.

FIGS. 2A to 2G illustrate cross-sectional views showing a method of fabricating the semiconductor device of FIG. 1A.

FIG. 3 illustrates a plan view showing a semiconductor device according to example embodiments of inventive concepts.

FIG. 4A illustrates a cross-sectional view taken along lines R1-R1′, R2-R2′, R3-R3′, R4-R4′, and R5-R5′ of FIG. 3.

FIG. 4B illustrates an enlarged view showing section P4 of FIG. 4A.

FIGS. 5A to 5L illustrate cross-sectional views showing a method of fabricating a semiconductor device having the cross-section of FIG. 4A.

FIG. 6A illustrates a cross-sectional view taken along lines R1-R1′, R2-R2′, R3-R3′, R4-R4′, and R5-R5′ of FIG. 3.

FIG. 6B illustrates an enlarged view showing section P5 of FIG. 6A.

DETAILED DESCRIPTION OF EMBODIMENTS

Some example embodiments of inventive concepts will now be described in detail with reference to the accompanying drawings to aid in clearly explaining inventive concepts.

FIG. 1A illustrates a cross-sectional view showing a semiconductor device according to example embodiments of inventive concepts. FIG. 1B illustrates an enlarged view showing section P3 of FIG. 1A.

Referring to FIG. 1A, a substrate 1 may be provided to include a first region A and a second region B. The substrate 1 may be or include, for example, a single crystalline silicon substrate or a silicon-on-insulator (SOI) substrate. The first region A may be an NMOS region. The second region B may be a PMOS region. A first trench 2 a may be formed in the substrate 1 on the first region A. A second trench 2 b may be formed in the substrate 1 on the second region B. A third trench 2 d may be formed on a boundary between the first and second regions A and B. A first device isolation layer 9 a, a second device isolation layer 9 b, and/or a third device isolation layer 9 d may be provided in the first trench 2 a, the second trench 2 b, and the third trench 2 d, respectively.

The first device isolation layer 9 a may include a first liner 3 a conformally covering an inner wall of the first trench 2 a, a first buried insulation layer 7 a filing the first trench 2 a, and/or a second liner 5 a between the first liner 3 a and the first buried insulation layer 7 a. The second device isolation layer 9 b may include a third liner 3 b conformally covering an inner wall of the second trench 2 b, a second buried insulation layer 7 b filling the second trench 2 b, and/or a fourth liner 5 b between the third liner 3 b and the second buried insulation layer 7 b. The third device isolation layer 9 d may include a fifth liner 3 d conformally covering an inner wall of the third trench 2 d, a third buried insulation layer 7 d filling the third trench 2 d, and/or a sixth liner 5 d between the fifth liner 3 d and the third buried insulation layer 7 d. The first, third, and fifth liners 3 a, 3 b, and 3 d may be formed of the same material, for example, a silicon oxide layer. The second, fourth, and sixth liners 5 a, 5 b, and 5 d may be formed of the same material, for example, a silicon nitride layer. The first, second, and third buried insulation layers 7 a, 7 b, and 7 d may be formed of the same material, for example, a silicon oxide layer.

On the first region A, a first gate pattern GP1 may be disposed on the substrate 1. First source/drain regions 35 a may be disposed in the substrate 1 on opposite sides of the first gate pattern GP1. The first source/drain regions 35 a may be doped with, for example, N-type impurities.

On the second region B, a channel layer 13 may be disposed on the substrate 1. The channel layer 13 may have a lattice constant greater than that of the substrate 1. For example, the channel layer 13 may be formed of silicon-germanium. The channel layer 13 may increase the hole mobility of PMOS transistors. In addition, the channel layer 13 may serve to reduce a work function. A second gate pattern GP2 may be disposed on the channel layer 13. Second source/drain regions 35 b may be disposed in the channel layer 13 and the substrate 1 on opposite sides of the second gate pattern GP2. The second source/drain regions 35 b may be doped with, for example, P-type impurities.

A dummy gate pattern GPd may be disposed on the boundary between the first and second regions A and B. The dummy gate pattern GPd may not actually operate, but may be formed to maintain an etching process condition regardless of the position of the substrate 1 and to reduce or prevent a loading effect. In addition, the dummy gate pattern GPd may be formed to reduce or prevent a dishing phenomenon that may occur when a chemical mechanical polishing (CMP) process is subsequently performed to form an interlayer dielectric layer.

The first gate pattern GP1 may include a first gate dielectric layer 15 a, a first high-k dielectric pattern 17 a, a first N-type metal-containing pattern 19 a, a first diffusion barrier pattern 23 a, a first P-type metal-containing pattern 25 a, a first lower electrode 27 a, and/or a first upper electrode 29 a that are sequentially stacked. A first gate capping pattern 31 a may be disposed on the first gate pattern GP1. The first N-type metal-containing pattern 19 a may contact the first high-k dielectric pattern 17 a. The first gate pattern GP1 may have a first thickness T1.

The second gate pattern GP2 may include a second gate dielectric layer 15 b, a second high-k dielectric pattern 17 b, a second diffusion barrier pattern 23 b, a second P-type metal-containing pattern 25 b, a second lower electrode 27 b, and/or a second upper electrode 29 b that are sequentially stacked. A second gate capping pattern 31 b may be disposed on the second gate pattern GP2. The second P-type metal-containing pattern 25 b may be adjacent to the second high-k dielectric pattern 17 b. The second gate pattern GP2 may exclude, or not include, the N-type metal-containing pattern 19 a. The second gate pattern GP2 may have a second thickness T2. Since the second gate pattern GP does not include the N-type metal-containing pattern 19 a, the second thickness T2 may be less than the first thickness T1.

A dummy gate capping pattern 31 d may be disposed on the dummy gate pattern GPd. The dummy gate pattern GPd may include a first segment P1 adjacent to the first region A and a second segment P2 adjacent to the second region B. The dummy gate pattern GPd may be configured such that the first segment P1 may have a bottom surface higher than that of the second segment P2. The first segment P1 of the dummy gate pattern GPd may include a dummy high-k dielectric pattern 17 d, a dummy N-type metal-containing pattern 19 d, a dummy diffusion barrier pattern 23 d, a dummy P-type metal-containing pattern 25 d, a dummy lower electrode 27 d, and/or a dummy upper electrode 29 d that are sequentially stacked. The second segment P2 of the dummy gate pattern GPd may be configured identically to the first segment P1, except that the dummy N-type metal-containing pattern 19 d is excluded. On the second segment P2, the dummy diffusion barrier pattern 23 d may contact the dummy high-k dielectric pattern 17 d. The dummy diffusion barrier pattern 23 d may contact a lateral surface of the dummy N-type metal-containing pattern 19 d. On the second segment P2, the dummy upper electrode 29 d and the dummy gate capping pattern 31 d may be partially recessed on their top surfaces.

The first and second gate dielectric layers 15 a and 15 b may be formed of, for example, a silicon oxide layer or a silicon oxynitride layer. The first high-k dielectric pattern 17 a, the second high-k dielectric pattern 17 b, and the dummy high-k dielectric pattern 17 d may be formed of a material whose dielectric constant is greater than that of a silicon oxide layer, which material may include at least one of hafnium oxide (HfO), hafnium silicate (HfSiO), hafnium oxynitride (HfON), hafnium silicon oxynitride (HfSiON), lanthanum oxide (LaO), lanthanum aluminum oxide (LaAlO), zirconium oxide (ZrO), zirconium silicate (ZrSiO), zirconium oxynitride (ZrON), zirconium silicon oxynitride (ZrSiON), tantalum oxide (TaO), titanium oxide (TiO), barium strontium titanium oxide (BaSrTiO), barium titanium oxide (BaTiO), strontium titanium oxide (SrTiO), yttrium oxide (YO), aluminum oxide (AlO), and lead scandium tantalum oxide (PbScTaO). For example, the first high-k dielectric pattern 17 a, the second high-k dielectric pattern 17 b, and the dummy high-k dielectric pattern 17 d may be formed of HfO₂, Al₂O₃, HfAlO₃, Ta₂O₃, or TiO₂. The first N-type metal-containing pattern 19 a and the dummy N-type metal-containing pattern 19 d may be formed of a metal-containing layer having an N work function. For example, the first N-type metal-containing pattern 19 a and the dummy N-type metal-containing pattern 19 d may include at least one of lanthanum (La), lanthanum oxide (LaO), tantalum (Ta), tantalum nitride (TaN), niobium (Nb), and titanium nitride (TiN). For detailed example, each of the first N-type metal-containing pattern 19 a and the dummy N-type metal-containing pattern 19 d may include a lanthanum layer and a titanium nitride layer that are sequentially stacked, or a lanthanum oxide layer and a titanium nitride layer that are sequentially stacked.

The first P-type metal-containing pattern 25 a, the second P-type metal-containing pattern 25 b, and the dummy P-type metal-containing pattern 25 d may be formed of a metal-containing layer having a P work function. For example, the first P-type metal-containing pattern 25 a, the second P-type metal-containing pattern 25 b, and the dummy P-type metal-containing pattern 25 d may include at least one of aluminum (Al), aluminum oxide (Al₂O₃), titanium nitride (TiN), tungsten nitride (WN), and ruthenium oxide (RuO₂). For detailed example, each of the first P-type metal-containing pattern 25 a, the second P-type metal-containing pattern 25 b, and the dummy P-type metal-containing pattern 25 d may include an aluminum oxide layer and a titanium nitride layer that are sequentially stacked, or an aluminum oxide layer and a titanium nitride layer that are sequentially stacked.

The first diffusion barrier pattern 23 a, the second diffusion barrier pattern 23 b, and the dummy diffusion barrier pattern 23 d may be formed of, for example, a titanium nitride layer, a tungsten nitride layer, or a tantalum nitride layer. The first diffusion barrier pattern 23 a, the second diffusion barrier pattern 23 b, and the dummy diffusion barrier pattern 23 d may reduce or prevent diffusion of aluminum included in the first P-type metal-containing pattern 25 a, the second P-type metal-containing pattern 25 b, and/or the dummy P-type metal-containing pattern 25 d. When there is no need to reduce or prevent diffusion of materials included in the first P-type metal-containing pattern 25 a, the second P-type metal-containing pattern 25 b, and the dummy P-type metal-containing pattern 25 d, it may be possible to exclude the first diffusion barrier pattern 23 a, the second diffusion barrier pattern 23 b, and the dummy diffusion barrier pattern 23 d. In this case, on the first region A, the first P-type metal-containing pattern 25 a may contact the first N-type metal-containing pattern 19 a. In addition, on the second region B, the second P-type metal-containing pattern 25 b may contact the second high-k dielectric pattern 17 b.

The first lower electrode 27 a, the second lower electrode 27 b, and the dummy lower electrode 27 d may include polysilicon doped with impurities. The impurities doped in the first lower electrode 27 a may have a different conductivity from that of the impurities doped in the second lower electrode 27 b. For example, the first lower electrode 27 a may be doped with N-type impurities, and the second lower electrode 27 b may be doped with P-type impurities.

The first upper electrode 29 a, the second upper electrode 29 b, and the dummy upper electrode 29 d may include at least one of a metal silicide layer, a metal nitride layer, and a metal-containing layer. The metal silicide layer may include, for example, cobalt silicide or tungsten silicide. The metal nitride layer may be or include, for example, a titanium nitride layer or a tantalum nitride layer. The metal-containing layer may include, for example, one of tungsten, aluminum, and copper.

The first gate capping pattern 31 a, the second gate capping pattern 31 b, and the dummy gate capping pattern 31 d may be formed of, for example, a silicon nitride layer.

The second device isolation layer 9 b may be configured such that the fourth liner 5 b may have a top end that protrudes beyond those of the third liner 3 b and the second buried insulation layer 7 b. The third liner 3 b may have a first recess R1 on its upper portion. The second buried insulation layer 7 b may have a second recess R2 on its upper portion. A first depth DP1 from a bottom surface of the second gate pattern GP2 to a lowest point of the first recess R1 may be less than a second depth DP2 from the bottom surface of the second gate pattern GP2 to a lowest point of the second recess R2.

The third device isolation layer 9 d may be configured such that the sixth liner 5 d may have a top end that protrudes beyond those of the fifth liner 3 d and the third buried insulation layer 7 d. The fifth liner 3 d may have a third recess R3 on its upper portion adjacent to the second segment P2 of the dummy gate pattern GPd. The third buried insulation layer 7 d may have a fourth recess R4 on its upper portion adjacent to the second segment P2 of the dummy gate pattern GPd. A depth from the bottom surface of the second gate pattern GP2 to a lowest point of the third recess R3 may correspond to, or be the same as, the first depth DP1. A depth from the bottom surface of the second gate pattern GP2 to a lowest point of the fourth recess R4 may correspond to, or be the same as, the second depth DP2.

Referring to FIG. 1B, the first device isolation layer 9 a may be configured such that the second liner 5 a may have a top end that protrudes beyond those of the first liner 3 a and the first buried insulation layer 7 a. The first liner 3 a may have a fifth recess R5 on its upper portion. The first buried insulation layer 7 a may have a sixth recess R6 on its upper portion. A third depth DP3 from a bottom surface of the first gate pattern GP1 to a lowest point of the fifth recess R5 may be less than a fourth depth DP4 from the bottom surface of the first gate pattern GP1 to a lowest point of the sixth recess R6.

Referring back to FIG. 1A, the first depth DP1 may be greater than the third depth DP3. The second depth DP2 may be greater than the fourth depth DP4. The first depth DP1 may be greater than the fourth depth DP4.

The fifth liner 3 d may have a seventh recess R7 on its upper portion adjacent to the first segment P1 of the dummy gate pattern GPd. The third buried insulation layer 7 d may have an eighth recess R8 on its upper portion adjacent to the first segment P1 of the dummy gate pattern GPd. A depth from the bottom surface of the first gate pattern GP1 to a lowest point of the seventh recess R7 may correspond to, or be the same as, the third depth DP3. A depth from the bottom surface of the first gate pattern GP1 to a lowest point of the eighth recess R8 may correspond to, or be the same as, the fourth depth DP4.

FIGS. 2A to 2G illustrate cross-sectional views showing a method of fabricating the semiconductor device of FIG. 1A.

Referring to FIG. 2A, a substrate 1 may be prepared to include a first region A and a second region B. The substrate 1 may be etched to form first, second, and third trenches 2 a, 2 b, and 2 d. A first liner layer and a second liner layer may be conformally formed on an entire surface of the substrate 1. A buried insulation layer may be formed to fill the first, second, and third trenches 2 a, 2 b, and 2 d. A chemical mechanical polishing (CMP) process may be performed to respectively form first, second, and third device isolation layers 9 a, 9 b, and 9 d in the first, second, and third trenches 2 a, 2 b, and 2 d.

The first device isolation layer 9 a may include a first liner 3 a conformally covering an inner wall of the first trench 2 a, a first buried insulation layer 7 a filing the first trench 2 a, and a second liner 5 a between the first liner 3 a and the first buried insulation layer 7 a. The second device isolation layer 9 b may include a third liner 3 b conformally covering an inner wall of the second trench 2 b, a second buried insulation layer 7 b filling the second trench 2 b, and a fourth liner 5 b between the third liner 3 b and the second buried insulation layer 7 b. The third device isolation layer 9 d may include a fifth liner 3 d conformally covering an inner wall of the third trench 2 d, a third buried insulation layer 7 d filling the third trench 2 d, and a sixth liner 5 d between the fifth liner 3 d and the third buried insulation layer 7 d.

Referring to FIG. 2B, a first mask layer 11 may be formed to cover the first region A and to expose the second region B. The first mask layer 11 may be formed of, for example, a silicon oxide layer. The first mask layer 11 may cover a portion of the third device isolation layer 9 d and exposes other portions of the third device isolation layer 9 d. The first mask layer 11 may be used as an epitaxial barrier to form a channel layer 13 on a top surface of the substrate 1 exposed on the second region B. The channel layer 13 may be formed by, for example, selective epitaxial growth (SEG). The channel layer 13 may include silicon-germanium. The channel layer 13 may not be formed on the first, second, and third device isolation layers 9 a, 9 b, and 9 d.

Referring to FIG. 2C, the first mask layer 11 may be removed. For example, a wet etching process may be performed to remove the first mask layer 11. When the first mask layer 11 is formed of a silicon oxide layer, the wet etching process may use, for example, fluoric acid as an etchant. When the first mask layer 11 is removed, the second and third device isolation layers 9 b and 9 d may also be etched on their upper portions exposed on the second region B. For example, etching may be performed on upper portions of the third liner 3 b, the second buried insulation layer 7 b, the fifth liner 3 d, and the third buried insulation layer 7 d that can be formed of the same material. Accordingly, a first recess R1 may be formed on the third liner 3 b. A second recess R2 may be formed on the second buried insulation layer 7 b. A third recess R3 may be formed on the fifth liner 3 d. A fourth recess R4 may be formed on the third buried insulation layer 7 d. The third and fifth liners 3 b and 3 d may have relatively narrow widths such that etchant attack may be difficult, while the second and third buried insulation layers 7 b and 7 d may have relatively wide exposed areas such that the etchant attack may be easier. Therefore, each of the first and third recesses R1 and R3 may be formed to have a depth (e.g., the first depth DP1 of FIG. 1) less than that (e.g., the second depth DP2 of FIG. 1) of each of the second and fourth recesses R2 and R4. When the first mask layer 11 is etched, the fourth and sixth liners 5 b and 5 d may not be etched due to etch resistance caused by their material different from that of the first mask layer 11. As a result, the fourth and sixth liners 5 b and 5 d may have top ends that protrude beyond the third liner 3 b, the fifth liner 3 d, the second buried insulation layer 7 b, and the third buried insulation layer 7 d.

Referring to FIG. 2D, on the first region A, a first gate dielectric layer 15 a may be formed on the substrate 1, and on the second region B, a second gate dielectric layer 15 b may be formed on the channel layer 13. The first and second gate dielectric layers 15 a and 15 b may be simultaneously formed by a thermal oxidation process or a deposition process. The first and second gate dielectric layers 15 a and 15 b may be formed of, for example, a silicon oxide layer or a silicon oxynitride layer. Although not shown, before the first and second gate dielectric layers 15 a and 15 b are formed, a cleaning process may be performed on a surface of the substrate 1. The cleaning process may partially etch surfaces of the first, second, and third device isolation layers 9 a, 9 b, and 9 d. A high-k dielectric layer 17 may be conformally formed on the entire surface of the substrate 1. An N-type metal-containing layer 19 may be conformally formed on the high-k dielectric layer 17. The N-type metal-containing layer 19 may be difficult to deposit in the first and third recesses R1 and R3, and thus may have a relatively small thickness in the first and third recesses R1 and R3. The N-type metal-containing layer 19 may be or include a metal-containing layer having an N work function.

The N-type metal-containing layer 19 may include at least one of lanthanum (La), lanthanum oxide (LaO), tantalum (Ta), tantalum nitride (TaN), niobium (Nb), and titanium nitride (TiN). For example, the N-type metal-containing layer 19 may include a lanthanum layer and a titanium nitride layer that are sequentially stacked, or a lanthanum oxide layer and a titanium nitride layer that are sequentially stacked.

Referring to FIG. 2E, a second mask layer 21 may be formed on the N-type metal-containing layer 19, covering the first region A and exposing the second region B. The second mask layer 21 may be formed of at least one of a photoresist layer, an amorphous carbon layer (ACL), a spin-on-hardmask (SOH) layer, a spin-on-carbon (SOC) layer, and a silicon nitride layer. The second mask layer 21 may be used as an etching mask to etch the N-type metal-containing layer 19 on the second region B, which may result in exposing the high-k dielectric layer 17. The N-type metal-containing layer 19 may be etched by a wet etching process that uses an etchant including, for example, sulfuric acid. In comparison with a dry etching process, the wet etching process may remarkably reduce etching damages to the high-k dielectric layer 17 and selectively remove the N-type metal-containing layer 19 from the second region B.

Referring to FIG. 2F, the second mask layer 21 may be removed. A diffusion barrier layer 23, a P-type metal-containing layer 25, a lower electrode layer 27, an upper electrode layer 29, and a capping layer 31 may be sequentially stacked on the entire surface of the substrate 1. The diffusion barrier layer 23 may be or include at least one of a titanium nitride layer, a tungsten nitride layer, and a tantalum nitride layer. The P-type metal-containing layer 25 may be or include a metal-containing layer having a P work function. For example, the P-type metal-containing layer 25 may include at least one of aluminum (Al), aluminum oxide (Al₂O₃), titanium nitride (TiN), tungsten nitride (WN), and ruthenium oxide (RuO₂). For detailed example, the P-type metal-containing layer 25 may include an aluminum oxide layer and a titanium nitride layer that are sequentially stacked, or an aluminum oxide layer and a titanium nitride layer that are sequentially stacked.

The lower electrode layer 27 may be formed of an impurity-doped polysilicon layer. The formation of the lower electrode layer 27 may include depositing a polysilicon layer, doping N-type impurities into the lower electrode layer 27 on the first region A, and doping P-type impurities into the lower electrode layer 27 on the second region B.

Third mask patterns 33 may be formed on the capping layer 31. The third mask patterns 33 may limit or define shapes of a first gate pattern GP1, a second gate pattern GP2, and a dummy gate pattern GPd which will be discussed below. The third mask patterns 33 may be formed of a photoresist layer, an amorphous carbon layer (ACL), a spin-on-hardmask (SOH) layer, or a spin-on-carbon (SOC) layer.

Referring to FIG. 2G, on the first region A, the third mask patterns 33 may be used as an etching mask to successively etch the capping layer 31, the upper electrode layer 29, the lower electrode layer 27, the P-type metal-containing layer 25, the diffusion barrier layer 23, the N-type metal-containing layer 19, the high-k dielectric layer 17, and the first gate dielectric layer 15 a, which may result in the formation of a first gate pattern GP1. On the second region B, the third mask patterns 33 may be used as an etching mask to successively etch the capping layer 31, the upper electrode layer 29, the lower electrode layer 27, the P-type metal-containing layer 25, the diffusion barrier layer 23, the high-k dielectric layer 17, and the second gate dielectric layer 15 b, which may result in the formation of a second gate pattern GP2. On the first and second regions A and B, the third mask patterns 33 may be used as an etching mask to successively etch the capping layer 31, the upper electrode layer 29, the lower electrode layer 27, the P-type metal-containing layer 25, the diffusion barrier layer 23, the N-type metal-containing layer 19, and the high-k dielectric layer 17, which may result in the formation of a dummy gate pattern GPd. The first and second gate patterns GP1 and GP2 and the dummy gate pattern GPd may be formed at the same time. In this operation, the first device isolation layer 9 a may also be partially etched and the third device isolation layer 9 d may also be etched on its portion that is positioned on the first region A, which partial etching may form fifth, sixth, seventh, and eighth recesses R5, R6, R7, and R8.

Since the first and third recesses R1 and R3 are relatively narrow and deep, when a metal-containing layer has an increased thickness in the first and third recesses R1 and R3, it may be difficult to completely remove the metal-containing layer during the etching process of FIG. 2G. If the N-type metal-containing layer 19 is not removed from the second region B in the operation of FIG. 2E, the presence of the N-type metal-containing layer 19 on the second region B may cause the first and third recesses R1 and R3 to have the N-type metal-containing layer 19 therein. In this case, an over-etching may be required to remove the N-type metal-containing layer 19 from the first and third recesses R1 and R3 during the etching process of FIG. 2G, and thus the substrate 1 on the first region A may suffer from etching damages. However, according to inventive concepts, the N-type metal-containing layer 19 may be removed in advance from the second region B, it may be possible to reduce a process burden on the etching process of FIG. 2G. It may also be possible to decrease the probability of the presence of metal residues in the first and third recesses R1 and R3. As a result, a semiconductor device may be fabricated to have enhanced reliability.

FIG. 3 illustrates a plan view showing a semiconductor device according to example embodiments of inventive concepts. FIG. 4A illustrates a cross-sectional views taken along lines R1-R1′, R2-R2′, R3-R3′, R4-R4′, and R5-R5′ of FIG. 3. FIG. 4B illustrates an enlarged view showing section P4 of FIG. 4A.

Referring to FIGS. 3 and 4A, a substrate 1 may be provided to include a cell array region CA, a first peripheral region PA1, a second peripheral region PA2, a third peripheral region PB1, and/or a fourth peripheral region PB2. The first, second, third, and fourth peripheral regions PA1, PA2, PB1, and PB2 may be disposed around the cell array region CA. The first, second, third, and/or fourth peripheral regions PA1, PA2, PB1, and PB2 may be provided with peripheral circuits for driving word lines WL and bit lines BL disposed on the cell array region CA. The first peripheral region PA1 may be provided thereon with, for example, an NMOS low-voltage transistor. The second peripheral region PA2 may be provided thereon with, for example, an NMOS high-voltage transistor. The third peripheral region PB1 may be provided thereon with, for example, a PMOS low-voltage transistor. The fourth peripheral region PB2 may be provided thereon with, for example, a PMOS high-voltage transistor.

On the cell array region CA, the substrate 1 may be provided therein with a cell device isolation layer 102 defining cell active sections ACTC. Each of the cell active sections ACTC may have an isolated shape. When viewed in plan, each of the cell active sections ACTC may have a bar shape elongated along a first direction D1. The substrate 1 may be or include a single crystalline silicon substrate or a silicon-on-insulator (SOI) substrate. As discussed with reference to FIG. 1A, the cell device isolation layer 102 may include an oxide liner, a nitride liner, and a buried insulation layer. The cell active sections ACTC may be arranged in parallel to each other in the first direction D1 such that one of the cell active sections ACTC may have an end adjacent to a center of a neighboring one of the cell active sections ACTC.

The word lines WL may run across the cell active sections ACTC. The word lines WL may be disposed in grooves formed in the cell device isolation layer 102 and the cell active sections ACTC. The word lines WL may be parallel to a second direction D2 intersecting the first direction D1. The word lines WL may be buried within the substrate 1.

A first doped region 112 a may be disposed in the cell active section ACTC between a pair of the word lines WL, and a pair of second doped regions 112 b may be disposed in opposite edge portions of the cell active section ACTC. The first and second doped regions 112 a and 112 b may be doped with, for example, N-type impurities. The first doped region 112 a may correspond to a common drain region, and the second doped regions 112 b may correspond to source regions.

Referring to FIGS. 4A and 4B, on the cell array region CA, a buffer layer 110 may be disposed on the substrate 1. The buffer layer 110 may include a first insulation layer 108, a second insulation layer 106, and/or a third insulation layer 104 that are sequentially stacked. The second insulation layer 106 may be formed of a material exhibiting an etch selectivity to the first and third insulation layers 108 and 104. For example, the second insulation layer 106 may be formed of a silicon nitride layer. The first and third insulation layers 108 and 104 may be formed of a silicon oxide layer.

The bit lines BL may be disposed on the buffer layer 110. The bit lines BL may run across the word lines WL. As shown in FIG. 3, the bit lines BL may be parallel to a third direction D3 intersecting the first and second directions D1 and D2. Each of the bit lines BL may include a bit line lower electrode 130 t, a bit line diffusion barrier pattern 136 t, and/or a bit line upper electrode 138 t that are sequentially stacked. The bit line lower electrode 130 t may include impurity-doped polysilicon. The bit line diffusion barrier pattern 136 t may be formed of, for example, a titanium nitride layer, a tungsten nitride layer, or a tantalum nitride layer. The bit line upper electrode 138 t may be or include one of aluminum, tungsten, and copper. A bit line capping pattern 150 may be disposed on the bit line BL. The bit line capping pattern 150 may include a first bit line capping pattern 140 t and a second bit line capping pattern 148 t that are sequentially stacked. The first and second bit line capping patterns 140 t and 148 t may be formed of, for example, a silicon nitride layer.

A first bit line spacer 154 may cover a sidewall of the bit line BL and a lower sidewall of the bit line capping pattern 150. A second bit line spacer 156 may cover an upper sidewall of the bit line capping pattern 150. Each of the first and second bit line spacers 154 and 156 may have a single layered structure or a multi-layered structure including at least one of a silicon nitride layer, a silicon oxide layer, and a silicon oxynitride layer. The second bit line spacer 156 may include an air gap therein. The second bit line spacer 156 may have a width less than that of the first bit line spacer 154. In such a configuration, an interval between the first bit line spacers 154 may become wide between upper portions of the bit line capping patterns 150. As a result, an easy connection may be possible between a landing pad LP and a storage node contact BC which will be discussed below.

The buffer layer 110 may be interposed between the bit line BL and the cell device isolation layer 102 and between the first bit line spacer 154 and the substrate 1. The first bit line spacer 154 may have a sidewall aligned with that of the buffer layer 110.

The bit line BL may be electrically connected to the first doped region 112 a through a bit line contact DC. The bit line contact DC may be formed of, for example, impurity-doped polysilicon. A recess region 134 may be formed on an upper portion of the first doped region 112 a and an upper portion of the cell device isolation layer 102 adjacent to the first doped region 112 a. The bit line contact DC may be disposed in the recess region 134. A buried insulation pattern 152 may fill a space between a lower sidewall of the bit line contact DC and an inner wall of the recess region 134. The buried insulation pattern 152 may have a single-layered structure or a multi-layered structure including at least one of a silicon nitride layer and a silicon oxide layer.

Storage node contacts BC may be disposed between a pair of neighboring bit lines BL. The storage node contacts BC may be spaced apart from each other. The storage node contacts DC may include impurity-doped polysilicon. When viewed in plan, the storage node contacts BC may have island shapes spaced apart from each other. The storage node contacts BC may penetrate the buffer layer 110 and contact the second doped regions 112 b.

A storage node ohmic layer 158 may be disposed on the storage node contact BC. The storage node ohmic layer 158 may include metal silicide. For example, the storage node ohmic layer 158 may be or include cobalt silicide. A landing pad diffusion barrier pattern 160 may conformally cover the storage node ohmic layer 158, the first and second bit line spacers 154 and 156, and the bit line capping pattern 150. The landing pad diffusion barrier pattern 160 may be formed of, for example, at least one of a titanium nitride layer, a tungsten nitride layer, and a tantalum nitride layer.

A landing pad LP may be disposed on the landing pad diffusion barrier pattern 160. The landing pad LP may be formed of a material containing metal, such as tungsten, aluminum, or copper. The landing pad LP may have an upper portion that covers a top surface of the bit line capping pattern 150 and has a width greater than that of the storage node contact BC. A center of the landing pad LP may shift from a center of the storage node contact BC in a reverse direction to the second direction D2. A portion of the bit line BL may vertically overlap the landing pad LP.

A landing pad separation pattern 162 may separate neighboring landing pads LP from each other. The landing pad separation pattern 162 may have a single-layered structure or a multi-layered structure including at least one of a silicon nitride layer, a silicon oxide layer, and a silicon carbonitride layer. The landing pad separation pattern 162 may penetrate the second bit line spacer 156 and contact the first bit line spacer 154.

A cell interlayer dielectric layer 164 may be disposed on the landing pads LP and the landing pad separation pattern 162. The cell interlayer dielectric layer 164 may include a silicon oxide layer. A data storage element 168 may be disposed on the cell interlayer dielectric layer 164. The data storage element 168 may be or include a capacitor, a phase change material pattern, a variable resistance material pattern, or a magnetic tunnel junction pattern. The data storage element 168 may be electrically connected to the landing pad LP through a cell contact 166 penetrating the cell interlayer dielectric layer 164.

On the first peripheral region PA1, a peripheral device isolation layer (not shown) may define a first peripheral active section ACT1. On the first peripheral region PA1, a first peripheral gate pattern GP1 may be disposed on the substrate 1. The first peripheral gate pattern GP1 may include a first peripheral gate dielectric pattern 120 a, a first peripheral high-k dielectric pattern 122 a, a first N-type metal-containing pattern 124 a, a first P-type metal-containing pattern 126 a, a first peripheral lower electrode 130 a, a first peripheral diffusion barrier pattern 136 a, and/or a first peripheral upper electrode 138 a that are sequentially stacked. The first N-type metal-containing pattern 124 a may contact the first P-type metal-containing pattern 126 a. A first peripheral gate capping pattern 140 a may be disposed on the first peripheral gate pattern GP1.

On the second peripheral region PA2, a peripheral device isolation layer (not shown) may define a second peripheral active section ACT2. On the second peripheral region PA2, a second peripheral gate pattern GP2 may be disposed on the substrate 1. The second peripheral gate pattern GP2 may include a second peripheral gate dielectric pattern 118 b, a second peripheral high-k dielectric pattern 122 b, a second N-type metal-containing pattern 124 b, a second P-type metal-containing pattern 126 b, a second peripheral lower electrode 130 b, a second peripheral diffusion barrier pattern 136 b, and/or a second peripheral upper electrode 138 b that are sequentially stacked. The second N-type metal-containing pattern 124 b may contact the second P-type metal-containing pattern 126 b. A second peripheral gate capping pattern 140 b may be disposed on the second peripheral gate pattern GP2.

A first gate length GL1 between opposite sidewalls of the first peripheral gate pattern GP1 may be less than a second gate length GL2 between opposite sidewalls of the second peripheral gate pattern GP2. The first peripheral gate dielectric pattern 120 a may be thinner than the second peripheral gate dielectric pattern 118 b. The first peripheral gate dielectric pattern 120 a may include a different material from that of the second peripheral gate dielectric pattern 118 b. For example, the first peripheral gate dielectric pattern 120 a may be formed of a silicon oxynitride layer. The second peripheral gate dielectric pattern 118 b may be formed of a silicon oxide layer.

First peripheral source/drain regions 144 a may be disposed in the substrate 1 on opposite sides of the first peripheral gate pattern GP1. Second peripheral source/drain regions 144 b may be disposed in the substrate 1 on opposite sides of the second peripheral gate pattern GP2. The first and second peripheral source/drain regions 144 a and 144 b may be doped with, for example, N-type impurities. The first peripheral source/drain region 144 a may have an impurity concentration different from that of the second peripheral source/drain region 144 b.

On the third peripheral region PB1, a peripheral device isolation layer (not shown) may define a third peripheral active section ACT3. On the third peripheral region PB1, a channel layer 116 may be disposed on the substrate 1. The channel layer 116 may have a lattice constant greater than that of the substrate 1. The channel layer 116 may be formed of, for example, silicon-germanium. A third peripheral gate pattern GP3 may be disposed on the channel layer 116. The third peripheral gate pattern GP3 may include a third peripheral gate dielectric pattern 120 c, a third peripheral high-k dielectric pattern 122 c, a third P-type metal-containing pattern 126 c, a third peripheral lower electrode 130 c, a third peripheral diffusion barrier pattern 136 c, and/or a third peripheral upper electrode 138 c that are sequentially stacked. The third peripheral high-k dielectric pattern 122 c may contact the third P-type metal-containing pattern 126 c. A third peripheral gate capping pattern 140 c may be disposed on the third peripheral gate pattern GP3.

On the fourth peripheral region PB2, a peripheral device isolation layer (not shown) may define a fourth peripheral active section ACT4. On the fourth peripheral region PB2, a fourth peripheral gate pattern GP4 may be disposed on the substrate 1. The fourth peripheral gate pattern GP4 may include a fourth peripheral gate dielectric pattern 118 d, a fourth peripheral high-k dielectric pattern 122 d, a fourth P-type metal-containing pattern 126 d, a fourth peripheral lower electrode 130 d, a fourth peripheral diffusion barrier pattern 136 d, and/or a fourth peripheral upper electrode 138 d that are sequentially stacked. The fourth peripheral high-k dielectric pattern 122 d may contact the fourth P-type metal-containing pattern 126 d. A fourth gate capping pattern 140 d may be disposed on the fourth peripheral gate pattern GP4.

Third peripheral source/drain regions 144 c may be disposed in the channel layer 116 and the substrate 1 on opposite sides of the third peripheral gate pattern GP3. Fourth peripheral source/drain regions 144 d may be disposed in the substrate 1 on opposite sides of the fourth peripheral gate pattern GP4. The third and fourth peripheral source/drain regions 144 c and 144 d may be doped with, for example, P-type impurities. The third peripheral source/drain region 144 c may have an impurity concentration different from that of the fourth peripheral source/drain region 144 d.

The third peripheral gate pattern GP3 may have a gate length less than that of the fourth peripheral gate pattern GP4. The third peripheral gate dielectric pattern 120 c may be thinner than the fourth peripheral gate dielectric pattern 118 d. The third peripheral gate dielectric pattern 120 c may include a different material from that of the fourth peripheral gate dielectric pattern 118 d. For example, the third peripheral gate dielectric pattern 120 c may be formed of a silicon oxynitride layer. The fourth peripheral gate dielectric pattern 118 d may be formed of a silicon oxide layer.

The first, second, third, and fourth high-k dielectric patterns 122 a, 122 b, 122 c, and 122 d may be formed of a material, for example, a metal oxide layer, whose dielectric constant is greater than that of a silicon oxide layer. The first, second, third, and fourth high-k dielectric patterns 122 a, 122 b, 122 c, and 122 d may be formed of a material including at least one of hafnium oxide (HfO), hafnium silicate (HfSiO), hafnium oxynitride (HfON), hafnium silicon oxynitride (HfSiON), lanthanum oxide (LaO), lanthanum aluminum oxide (LaAlO), zirconium oxide (ZrO), zirconium silicate (ZrSiO), zirconium oxynitride (ZrON), zirconium silicon oxynitride (ZrSiON), tantalum oxide (TaO), titanium oxide (TiO), barium strontium titanium oxide (BaSrTiO), barium titanium oxide (BaTiO), strontium titanium oxide (SrTiO), yttrium oxide (YO), aluminum oxide (AlO), and lead scandium tantalum oxide (PbScTaO).

The first and second N-type metal-containing patterns 124 a and 124 b may be formed of a metal-containing layer having an N work function. The first and second N-type metal-containing patterns 124 a and 124 b may include at least one of lanthanum (La), lanthanum oxide (LaO), tantalum (Ta), tantalum nitride (TaN), niobium (Nb), and titanium nitride (TiN).

The first, second, third, and fourth P-type metal-containing patterns 126 a, 126 b, 126 c, and 126 d may be formed of a metal-containing layer having a P work function. The first, second, third, and fourth P-type metal-containing patterns 126 a, 126 b, 126 c, and 126 d may include at least one of aluminum (Al), aluminum oxide (Al₂O₃), titanium nitride (TiN), tungsten nitride (WN), and ruthenium oxide (RuO₂).

The first and second peripheral lower electrodes 130 a and 130 b may be formed of, for example, polysilicon doped with N-type impurities. The third and fourth peripheral lower electrodes 130 c and 130 d may be formed of, for example, polysilicon doped with P-type impurities. The first, second, third, and fourth peripheral lower electrodes 130 a, 130 b, 130 c, and 130 d may have the same thickness as that of the bit line lower electrode 130 t.

The first, second, third, and fourth peripheral diffusion barrier patterns 136 a, 136 b, 136 c, and 136 d may include at least one of a titanium nitride layer, a tungsten nitride layer, and a tantalum nitride layer. The first, second, third, and fourth peripheral diffusion barrier patterns 136 a, 136 b, 136 c, and 136 d may have the same thickness as that of the bit line diffusion barrier pattern 136 t. The first, second, third, and fourth peripheral upper electrodes 138 a, 138 b, 138 c, and 138 d may be formed of one of tungsten, copper, and aluminum. The first, second, third, and fourth peripheral upper electrodes 138 a, 138 b, 138 c, and 138 d may have the same thickness as that of the bit line upper electrode 138 t.

The first, second, third, and fourth peripheral gate capping patterns 140 a, 140 b, 140 c, and 140 d may have the same thickness as that of the bit line capping pattern 140 t.

Peripheral spacers 142 may cover sidewalls of the first, second, third, and fourth peripheral gate patterns GP1, GP2, GP3, and GP4. A peripheral interlayer dielectric layer 146 may cover the substrate 1 and sidewalls of the peripheral spacers 142. The peripheral interlayer dielectric layer 146 may be formed of, for example, a silicon oxide layer. A second capping layer 148 may be disposed on the peripheral interlayer dielectric layer 146. The second capping layer 148 may serve as an etch top layer. The second capping layer 148 may be formed of a different material from that of the peripheral interlayer dielectric layer 146. For example, the second capping layer 148 may be formed of a silicon nitride layer. The second capping layer 148 may have a thickness substantially the same as that of the second bit line capping pattern 148 t.

Although not shown in FIG. 4A, the third peripheral region PB2 may be provided thereon with a peripheral device isolation layer (not shown) having the same structure as that of the second device isolation layer 9 b illustrated in FIG. 1A. In addition, the first, second, and fourth peripheral regions PA1, PA2, and PB2 may be provided thereon with a device isolation layer (not shown) having the same structure as that of the first device isolation layer 9 a illustrated in FIG. 1A. A peripheral device isolation layer (not shown) having the same structure as that of the third device isolation layer 9 d illustrated in FIG. 1A may be disposed on a boundary between the second and third peripheral regions PA2 and PB1 or between the fourth and third peripheral regions PB2 and PB1. In addition, a dummy gate pattern GPd of FIG. 1A may be disposed on the boundary between the second and third peripheral regions PA2 and PB1 or between the fourth and third peripheral regions PB2 and PB1.

FIGS. 5A to 5L illustrate cross-sectional views showing a method of fabricating a semiconductor device having the cross-section of FIG. 4A.

Referring to FIGS. 3 and 5A, a cell device isolation layer 102 and a peripheral device isolation layer (not shown) may be formed on a substrate 1 including a cell array region CA, a first peripheral region PA1, a second peripheral region PA2, a third peripheral region PB1, and a fourth peripheral region PB2, which may result in limiting or defining cell active sections ACTC and first, second, third, and fourth peripheral active sections ACT1, ACT2, ACT3, and ACT4. On the cell array region CA, buried word lines WL may be formed in the substrate 1. An ion implantation process may be performed to form first doped regions 112 a and second doped regions 112 b in the cell active sections ACTC on the cell array region CA. When the ion implantation process is performed, the first, second, third, and fourth peripheral regions PA1, PA2, PB1, and PB2 may be covered with a mask.

Referring to FIG. 5B, a first insulation layer 108, a second insulation layer 106, and a third insulation layer 104 may be sequentially stacked on an entire surface of the substrate 1, and then patterned to form a buffer layer 110 on the cell array region CA and to expose the first, second, third, and fourth peripheral regions PA1, PA2, PB1, and PB2. The substrate 1 may be provided with a first mask layer 114 that exposes the third peripheral region PB1 and covers the cell array region CA and the first, second, and fourth peripheral regions PA1, PA2, and PB2. The first mask layer 114 may be formed of, for example, a silicon oxide layer. The first mask layer 114 may correspond to the first mask layer 11 of FIG. 2B. The first mask layer 114 may be used as an epitaxial barrier layer to form a channel layer 116 on the substrate 1 on the third peripheral region PB1. The channel layer 116 may be formed of a silicon-germanium layer. The channel layer 116 may be formed by selective epitaxial growth (SEG).

Referring to FIG. 5C, the first mask layer 114 may be removed to expose a top surface of the buffer layer 110 on the cell array region CA and also to expose a top surface of the substrate 1 on the first, second, and fourth peripheral regions PA1, PA2, and PB2. In this operation, as discussed with reference to FIG. 2C, recesses R1 and R2 may be formed on the peripheral device isolation layer disposed on the third peripheral region PB1. A separate mask (not shown) may be used to cover the cell array region CA and the first and third peripheral regions PA1 and PB1, and to form a high-voltage gate dielectric layer 118 on the substrate 1 on the second and fourth peripheral regions PA2 and PB2. The high-voltage gate dielectric layer 118 may be formed of, for example, a silicon oxide layer.

Referring to FIG. 5D, a separate mask (not shown) may be used to cover the cell array region CA and the second and fourth peripheral regions PA2 and PB2, and to form a low-voltage gate dielectric layer 120 on the substrate 1 and the channel layer 116 on the first and third peripheral regions PA1 and PB1. The low-voltage gate dielectric layer 120 may be formed of, for example, a silicon oxynitride layer. The low-voltage gate dielectric layer 120 may be formed thinner than the high-voltage gate dielectric layer 118. A high-k dielectric layer 122 may be formed on the entire surface of the substrate 1. The high-k dielectric layer 122 may be formed by a deposition process, such as chemical vapor deposition (CVD) or atomic layer deposition (ALD). The high-k dielectric layer 122 may be formed on the cell array region CA and also on the first, second, third, and fourth peripheral regions PA1, PA2, PB1, and PB2.

Referring to FIG. 5E, an N-type metal-containing layer 124 may be formed on the entire surface of the substrate 1 and performing a wet etching process using a mask as discussed in FIG. 2E, with the result that the N-type metal-containing layer 124 may be removed from the cell array region CA and the third and fourth peripheral regions PB1 and PB2, but remain on the first and second peripheral regions PA1 and PA2. The N-type metal-containing layer 124 may be formed of a metal-containing layer having an N work function. For example, the N-type metal-containing layer 124 may include at least one of lanthanum (La), lanthanum oxide (LaO), tantalum (Ta), tantalum nitride (TaN), niobium (Nb), and titanium nitride (TiN).

Referring to FIG. 5F, a P-type metal-containing layer 126 may be stacked on the entire surface of the substrate 1. The P-type metal-containing layer 126 may be formed of a metal-containing layer having a P work function. For example, the P-type metal-containing layer 126 may include at least one of aluminum (Al), aluminum oxide (Al₂O₃), titanium nitride (TiN), tungsten nitride (WN), and ruthenium oxide (RuO₂). A second mask layer 128 may be formed to expose the cell array region CA and to cover the P-type metal-containing layer 126 on the first, second, third, and fourth peripheral regions PA1, PA2, PB1, and PB2. The second mask layer 128 may be or include at least one of a photoresist layer, an amorphous carbon layer (ACL), a spin-on-hardmask (SOH) layer, a spin-on-carbon (SOC) layer, and a silicon nitride layer.

Referring to FIGS. 5F and 5G, the second mask layer 128 may be used as an etching mask to perform an etching process to remove the P-type metal-containing layer 126 and the high-k dielectric layer 122 from the cell array region CA. The etching process may be a wet etching process using sulfuric acid to selectively remove the P-type metal-containing layer 126 and the high-k dielectric layer 122 without damage on the buffer layer 110. The second mask layer 128 may be removed to expose the P-type metal-containing layer 126 on the first, second, third, and fourth peripheral regions PA1, PA2, PB1, and PB2. A lower electrode layer 130 may be formed on the entire surface of the substrate 1. The lower electrode layer 130 may be formed of, for example, an impurity-doped polysilicon layer. For example, the formation of the lower electrode layer 130 may include depositing a polysilicon layer on the entire surface of the substrate 1, and then performing an ion implantation process a plurality of times to dope N-type impurities into the polysilicon layer on the cell array region CA and the first and second peripheral regions PA1 and PA2 and to dope P-type impurities into the polysilicon layer on the third and fourth peripheral regions PB1 and PB2.

Referring to FIG. 5H, a third mask layer 132 may be formed on the lower electrode layer 130. The third mask layer 132 may have an opening that roughly limits or defines the position of a bit line contact DC which will be discussed below. The third mask layer 132 may be or include, for example, a photoresist layer, an amorphous carbon layer (ACL), a spin-on-hardmask (SOH) layer, or a spin-on-carbon (SOC) layer. The third mask layer 132 may be used as an etching mask to partially remove the lower electrode layer 130, the buffer layer 110, and the first doped region 112 a of the substrate 1, which may result in the formation of a recess region 134. In this operation, an upper portion of the cell device isolation layer 102 may also be partially removed.

Referring to FIGS. 5H and 5I, the third mask layer 132 may be removed to expose an upper portion of the lower electrode layer 130. The substrate 1 may be provided on its entire surface with an impurity-doped polysilicon layer to fill the recess region 134, and then a chemical mechanical polishing (CMP) process may be performed to remove the polysilicon layer on the lower electrode layer 130 and to leave a polysilicon pattern 135 in the recess region 134. A diffusion barrier layer 136, an upper electrode layer 138, and a first capping layer 140 may be sequentially stacked on the lower electrode layer 130 and the polysilicon pattern 135. The diffusion barrier layer 136 may be or include at least one of a titanium nitride layer, a tungsten nitride layer, and a tantalum nitride layer. The upper electrode layer 138 may include one of tungsten, aluminum, and copper. The first capping layer 140 may be formed of, for example, a silicon nitride layer.

Referring to FIGS. 5I and 5J, a mask (not shown) may be used to etch the first capping layer 140, the upper electrode layer 138, the diffusion barrier layer 136, the lower electrode layer 130, the P-type metal-containing layer 126, the N-type metal-containing layer 124, the high-k dielectric layer 122, and the gate dielectric layers 118 and 120 on the first, second, third, and fourth peripheral regions PA1, PA2, PB1, and PB2, with the result that first, second, third, and fourth peripheral gate patterns GP1, GP2, GP3, and GP4 may be formed. In this operation, although not shown, a dummy gate pattern GPd of FIG. 2G may also be formed.

Referring to FIG. 5K, first and second peripheral source/drain regions 144 a and 144 b may be formed by doping, for example, N-type impurities into portions of the substrate 1 that are adjacent to the first and second peripheral gate patterns GP1 and GP2. Third and fourth peripheral source/drain regions 144 c and 144 d may be formed by doping, for example, P-type impurities into portions of the substrate 1 that are adjacent to the third and fourth peripheral gate patterns GP3 and GP4. A spacer layer may be conformally stacked on the entire surface of the substrate 1 and then anisotropically etched to form peripheral spacers 142 covering sidewalls of the first, second, third, and fourth peripheral gate patterns GP1, GP2, GP3, and GP4. A peripheral interlayer dielectric layer 146 may be formed on the entire surface of the substrate 1, and then a chemical mechanical polishing (CMP) process may be performed to expose at least a top surface of the second peripheral gate capping pattern 140 b. In addition, on the cell array region CA, a top surface of the first capping layer 140 may also be exposed When the CMP process is performed, the dummy gate pattern GPd may reduce or prevent a dishing phenomenon of the peripheral interlayer dielectric layer 146. A second capping layer 148 may be formed on the entire surface of the substrate 1.

Referring to FIGS. 5K and 5L, a mask (not shown) may be used to perform an etching process to etch the second capping layer 148, the first capping layer 140, the upper electrode layer 138, the diffusion barrier layer 136, and the lower electrode layer 130 on the cell array region CA, with the result that a bit line capping pattern 150 and a bit line BL may be formed. In this operation, the polysilicon pattern 135 in the recess region 134 may also be etched to form a bit line contact DC. The recess region 134 may be exposed on its sidewall and also be partially exposed on its floor surface. Since the buffer layer 110 has a triple-layered structure including the first, second, and third insulation layers 108, 106, and 104, the etching process may be easily controlled.

Referring back to FIG. 4A, a buried insulation pattern 152 may be formed to fill the recess region 134. A first bit line spacer 154 may be formed to cover a sidewall of each of the bit line capping pattern 150 and the bit line BL. The bit line capping pattern 150 and the first bit line spacer 154 may be used as an etching mask to perform an etching process to partially remove the buffer layer 110 and the second doped region 112 b that are between neighboring first bit line spacers 154. Since the buffer layer 110 has the triple-layered structure including the first, second, and third insulation layers 108, 106, and 104, the etching process may be easily controlled. As a result, a semiconductor device may be fabricated to have enhanced reliability.

A storage node contact BC coupled to the second doped region 112 b may be formed between neighboring first bit line spacers 154. An upper portion of the first bit line spacer 154 may be removed, and then a second bit line spacer 156 may be formed to cover an upper sidewall of the bit line capping pattern 150 and to have a width less than that of the first bit line spacer 154. A storage node ohmic layer 158 and a landing pad diffusion barrier pattern 160 may be sequentially formed on the storage node contact BC. A metal-containing layer may be formed on the landing pad diffusion barrier pattern 160 and then patterned to form landing pads LP, and a landing pad separation pattern 162 may be formed to fill a space between the landing pads LP. A cell interlayer dielectric layer 164, a cell contact 166, and a data storage element 168 may be formed.

FIG. 6A illustrates a cross-sectional view taken along lines R1-R1′, R2-R2′, R3-R3′, R4-R4′, and R5-R5′ of FIG. 3. FIG. 6B illustrates an enlarged view showing section P5 of FIG. 6A.

Referring to FIGS. 6A and 6B, the buffer layer 110 may further include a cell high-k dielectric pattern 122 t on the third insulation layer 104. The cell high-k dielectric pattern 122 t may be formed to have the same material and thickness as those of the first, second, third, and fourth high-k dielectric patterns 122 a, 122 b, 122 c, and 122 d. When, in the operation of FIG. 5F, the P-type metal-containing layer 126 is removed from the cell array region CA and the high-k dielectric layer 122 remains on the cell array region CA, a semiconductor device may be fabricated in accordance with example embodiments. Since the buffer layer 110 has a quadruple-layered structure including the cell high-k dielectric pattern 122 t besides the first, second, and third insulation layers 108, 106, and 104, the buffer layer 110 may serve as an improved etch stop layer during the etching process for forming the bit line BL as illustrated in FIG. 5L.

According to some example embodiments of inventive concepts, an NMOS region may be reduced or prevented from being over-etched such that a semiconductor device may be fabricated to have enhanced reliability. 

What is claimed is:
 1. A method of fabricating a semiconductor device, comprising: providing a substrate comprising a first region and a second region; forming a first gate dielectric layer and a second gate dielectric layer on the substrate of the first region and the second region, respectively; forming an N-type metal-containing layer on the first gate dielectric layer and the second gate dielectric layer; removing the N-type metal-containing layer on the second region; sequentially forming a P-type metal-containing layer, an electrode layer, and a capping layer on an entire surface of the substrate; and patterning the capping layer, the electrode layer, the P-type metal-containing layer, the N-type metal-containing layer and the first gate dielectric layer on the first region to form a first gate pattern and patterning the capping layer, the electrode layer, the P-type metal-containing layer and the second gate dielectric layer to form a second gate pattern on the second region.
 2. The method of claim 1, further comprising: patterning the capping layer, the electrode layer, the P-type metal-containing layer and the N-type metal-containing layer to form a dummy gate pattern between the first region and the second region, wherein the dummy gate pattern comprises: a first segment adjacent to the first region; and a second segment adjacent to the second region, wherein the first segment of the dummy gate pattern comprises a dummy high-k dielectric pattern, a dummy N-type metal-containing pattern, and a dummy P-type metal-containing pattern that are sequentially stacked, and wherein the second segment of the dummy gate pattern excludes the dummy N-type metal-containing pattern.
 3. The method of claim 1, before forming the first gate dielectric layer and the second gate dielectric layer, further comprising: forming first to third device isolation patterns in the substrate, the first device isolation pattern being at the first region, the second device isolation pattern being at the second region and the third device isolation pattern being between the first region and the second region; forming a first mask layer covering the first device isolation pattern, a portion of the third device isolation pattern and the substrate of the first region; forming a channel layer on the substrate of the second region; and removing the first mask layer.
 4. The method of claim 3, wherein the forming of the channel layer includes forming a silicon germanium layer by performing a selective epitaxial growth method.
 5. The method of claim 3, further comprising: removing another portion of the third device isolation pattern to form at least one recess region at the third device isolation pattern when the first mask layer is removed.
 6. The method of claim 1, wherein the substrate further comprises a cell region, and the method further comprises: forming a buffer layer on the substrate of the cell region, before forming the first gate dielectric layer and the second gate dielectric layer.
 7. The method of claim 6, wherein the buffer layer comprise a first insulation layer, a second insulation layer and a third insulation layer that are sequentially stacked, and the second insulation layer is formed of a material having an etch selectivity to both the first insulation layer and the third insulation layer.
 8. The method of claim 6, wherein the removing of the N-type metal-containing layer exposes the cell region.
 9. The method of claim 6, wherein the electrode layer and the capping layer cover the buffer layer at the cell region.
 10. The method of claim 6, after forming the first gate pattern and the second gate pattern, further comprising: patterning the capping layer and the electrode layer to form a bit line at the cell region.
 11. A method of fabricating a semiconductor device, comprising: providing a substrate comprising a cell region, an NMOS region, and a PMOS region; forming a first gate dielectric layer and a second gate dielectric layer on the substrate of the NMOS region and the PMOS region, respectively; forming an N-type metal-containing layer on the first gate dielectric layer and the second gate dielectric layer; removing the N-type metal-containing layer on the PMOS region; forming a P-type metal-containing layer on an entire surface of the substrate; removing the P-type metal-containing layer on the cell region; forming an electrode layer and a first capping layer on an entire surface of the substrate; and patterning the first capping layer, the electrode layer, the P-type metal-containing layer, the N-type metal-containing layer and the first gate dielectric layer on the NMOS region to form a first gate pattern and patterning the first capping layer, the electrode layer, the P-type metal-containing layer and the second gate dielectric layer to form a second gate pattern on the PMOS region.
 12. The method of claim 11, further comprising: forming an interlayer dielectric layer to cover the first gate pattern and the second gate pattern; forming a second capping layer on an entire surface of the substrate; and patterning the second capping layer, the first capping layer and the electrode layer to form a bit line at the cell region.
 13. The method of claim 11, further comprising: patterning the first capping layer, the electrode layer, the P-type metal-containing layer and the N-type metal-containing layer to form a dummy gate pattern between the NMOS region and the PMOS region, wherein the dummy gate pattern comprises: a first segment adjacent to the NMOS region; and a second segment adjacent to the PMOS region, wherein the first segment of the dummy gate pattern comprises a dummy high-k dielectric pattern, a dummy N-type metal-containing pattern, and a dummy P-type metal-containing pattern that are sequentially stacked, and wherein the second segment of the dummy gate pattern excludes the dummy N-type metal-containing pattern.
 14. The method of claim 11, before forming the first gate dielectric layer and the second gate dielectric layer, further comprising: forming first to third device isolation patterns in the substrate, the first device isolation pattern being at the NMOS region, the second device isolation pattern being at the PMOS region and the third device isolation pattern being between the NMOS region and the PMOS region; forming a first mask layer covering the first device isolation pattern, a portion of the third device isolation pattern and the substrate of the NMOS region; forming a channel layer on the substrate of the PMOS region; and removing the first mask layer.
 15. The method of claim 14, further comprising: removing another portion of the third device isolation pattern to form at least one recess region at the third device isolation pattern when the first mask layer is removed.
 16. The method of claim 11, further comprising: forming a buffer layer on the substrate of the cell region, before forming the first gate dielectric layer and the second gate dielectric layer.
 17. The method of claim 16, wherein the buffer layer comprise a first insulation layer, a second insulation layer and a third insulation layer that are sequentially stacked, and the second insulation layer is formed of a material having an etch selectivity to both the first insulation layer and the third insulation layer.
 18. A method of fabricating a semiconductor device, comprising: providing a substrate comprising a first region and a second region; forming a first gate dielectric layer and a second gate dielectric layer on the substrate of the first region and the second region, respectively; forming an N-type metal-containing layer on the first gate dielectric layer and the second gate dielectric layer; removing the N-type metal-containing layer on the second region; sequentially forming a P-type metal-containing layer, an electrode layer, and a capping layer on an entire surface of the substrate; patterning the capping layer, the electrode layer, the P-type metal-containing layer, the N-type metal-containing layer and the first gate dielectric layer on the first region to form a first gate pattern and patterning the capping layer, the electrode layer, the P-type metal-containing layer and the second gate dielectric layer to form a second gate pattern on the second region, and patterning the capping layer, the electrode layer, the P-type metal-containing layer and the N-type metal-containing layer to form a dummy gate pattern between the first region and the second region, wherein the dummy gate pattern comprises: a first segment adjacent to the first region; and a second segment adjacent to the second region, wherein the first segment of the dummy gate pattern comprises a dummy high-k dielectric pattern, a dummy N-type metal-containing pattern, and a dummy P-type metal-containing pattern that are sequentially stacked, and wherein the second segment of the dummy gate pattern excludes the dummy N-type metal-containing pattern.
 19. The method of claim 18, before forming the first gate dielectric layer and the second gate dielectric layer, further comprising: forming first to third device isolation patterns in the substrate, the first device isolation pattern being at the first region, the second device isolation pattern being at the second region and the third device isolation pattern being between the first region and the second region; forming a first mask layer covering the first device isolation pattern, a portion of the third device isolation pattern and the substrate of the first region; forming a channel layer on the substrate of the second region; and removing the first mask layer.
 20. The method of claim 19, further comprising: removing another portion of the third device isolation pattern to form at least one recess region at the third device isolation pattern when the first mask layer is removed. 